Академия наук республики узбекистан


THE MAIN CONTENT OF DOCTORAL DISSERTATION AS A



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polikristall kremnij olishning monosilanli texnologiyasi va kremnij strukturalarini yaratishning ionli stimullashgan usullari

THE MAIN CONTENT OF DOCTORAL DISSERTATION AS A 
SCIENTIFIC REPORT 
In the introduction 
of the dissertation, the topicality and relevance of the 
research are substantiated, the aim and objectives of the research, its object and 
subject are formulated, its conformity with the priorities of development of science 
and technology of the Republic of Uzbekistan is shown, the scientific novelty and 
practical results of the study are described, the theoretical and practical 
significance of the obtain
ed results are revealed, a list of introducing the research 
results into practice, published works are provided.
101 


1.
 

monosilane technology of polysilicon production
 
Production of polycrystalline silicon from monosilane is a promising way. 
Monosilane under no
rmal conditions is a gas with a boiling point -
112°C. At 
temperatures above 700°C and monosilane decomposes rapidly on silicon and 
hydrogen, which is the basis for the production of high purity silicon.
Silane as compared with traditional technology trichl
orosilane has several 
advantages: low decomposition temperature of monosilane and lower energy 
consumption; the reaction products are no aggressive chemical agents that reduce 
the purity of silicon; a significant difference in physical and chemical propert
ies of 
the silane and other compounds allows for more effective purification of 
monosilane from the most harmful impurities; besides himself monosilane and 
mixtures is a commercial product, necessary for the manufacture of semiconductor 
devices, including the release of solar cells made of amorphous silicon. However, 
this technology has drawbacks. Traditional methods of production of monosilane 
are quite complicated, which leads to the high cost of high
-purity monosilane for 
the semiconductor industry. Alko
xysilane process for producing monosilane is one 
of the promising methods, which are designed to replace traditional trichlorosilane 
polysilicon production technology. 
1.1. Technology of alkoxysilane synthesis
 
A direct reaction of metallurgical silicon and ethyl alcohol runs according to 
the following scheme:
Si + (4 - n)C
2
H
5
OH → nSiH(OC
2
H
5
)
3
 + (1-n) Si(OC
2
H
5
)
4
 + (2-n) H
2
 
(1.1)
 
where n is from 0 to 1. And the maximal selectivity to triethoxysilane 
SiH(OC2H5)
3
is achieved with n = 1 and the equation (1.1) becomes:
 
Si + 3C
2
H
5
OH → SiH(OC
2
H
5
)
3
 + H
2

(1.2)
Equations (1.1.) and (1.2) are also valid for other alcohols with C
2
H
5
substitution of the corresponding radical R; for example, replacement of C
2
H
5
by 
CH
3
leads to the equations:
Si + (4 - n)CH
3
OH → nSiH(
OCH
3
)
3
 + (1-n) Si(OCH
3
)
4
 + (2-n) H
2
(1.3)
 
and 
Si + 3CH
3
OH → SiH(OCH
3
)
3
 + H
2

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