Fotoenergetikada nanostrukturali yarimo‘tkazgich materiallar
II xalqaro ilmiy anjumani
19-20 noyabr 2021 yil
30
IONIZATION ENERGY AND DIFFUSION PROFILE OF HYDROGEN IN
SILICON FROM FIRST-PRINCIPLES CALCULATIONS
K. Ruzimov
1
, M. Ganchenkova
3
, and S. Zh. Karazhanov
2,3
1
Faculty of Physics and Mathematics, Urgench State University,
220100 Urgench,Khorezm, Uzbekistan
2
Department for Solar Energy, Institute for Energy Technology,
PO Box 40, 2027 Kjeller, Norway
3
Department of Materials Science, National Research Nuclear University
"MEPhI", 31 Kashirskoe sh, 115409, Moscow, Russia
Si is one of the important materials to be used in modern electronic,
photovoltaic devices and sensors. Hydrogen (H) is one of the light-weight
elements, which is often present in Si and plays key role in its electrical, optical,
and structural properties. It can passivate shallow donors and shallow acceptors,
deep level impurities, interface states, exhibit bistability upon forming complex
with some group-V impurities, enhance oxygen diffusion in
p
-Si, lead to formation
of nanoclusters, etc. Knowledge of its energy levels in the band gap and
development of methods of studies of them are crucial.
This work presents a study of ionization energy of hydrogen (H) located at
(or near to) the bond center (BC) in positively charged (H
+
) and neutral states (H
0
)
and at the antibonding (AB) site in negative charged state (H
-
) for silicon by first-
principles calculations by including the corrections such as the vibrational zero-
point energy, finite-size-scaling, band gap correction, and by hybrid functional.
Vienna
ab initio
simulation package (VASP) has been used that calculates the
Kohn-Sham eigenvalues within the framework of density functional theory (DFT).
Studies of ground state properties and electronic structure have been performed by
the generalized gradient approximation with Perdew–Burke–Ernzerhof exchange-
correlation functional and the projector-augmented wave (PAW) method as well as
Heyd-Scuseria-Ernzerhof (HSE06) hybrid functional.
By considering the 64, 216, 288, 512, and 1000 atom supercells the error
coming from the artificial interaction between the defect and its images in
neighboring supercells has been estimated for BC H
+
, BC H
0
, and for AB H
-
. We
have calculated formation energy for the above models of H and analyzed relative
stability of them as a function of Fermi level. We show that H
+
is stable for Fermi
levels from the topmost valence band to E(+/-). At higher Fermi levels up to the
conduction band negatively charged H is found to be stable. We found that neutral
state of H is metastable at all Fermi levels. Our theoretical study shows negative-
U
behavior of H in Si. Energy levels of different models of H in Si estimated in this
work within hybrid functional agrees well with previous theoretical estimations by
marker method.
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