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This Catalog is a compilation of equipment at the six Israel nano centers available to all users on a fee basis: internal users, researchers at other universities and industry.
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INNI encourages use of this equipment by all researchers and industry, improving cooperation on projects and more quickly advancing technology development.
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User fees are set by the Universities and all contracts are made directly with the relevant university. Information requests should be directed to the contact people indicated in the tables.
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TEL AVIV UNIVERSITY
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Instrument
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Description
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Equipment Location
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TAU Faculty
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Academia
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Industry
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Operator__Faculty_in_Charge__Contact_email'>Operator
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Faculty in Charge
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Contact email
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Contact phone
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Operator
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Self
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HRTEM Tecnai F20
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Transmission Electron Microscope Tecnai F20@:
200KV Field Emission Gun including EDS detector
Objective lens: Cs=1.2mm (Point Resolution 0.24nm, tilting ±40º)
Special attachment: Electron Holography
Special Software: TrueImage@ - Through focus reconstruction
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Wolfson MRC
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$300 (for 3 hours)
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TBD
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TBD
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Dr. Yossi Lereah
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MC director
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lereah@eng.tau.ac.il
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03-6407776
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HRSEM JSM-6700F
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Cold filed emission gun scanning electron microscope.Accelerating voltages 0.5-30 kV Resolution of 1.0 nm at 15 kV and 2.2 nm at 1.0 kV.Secondary electron imaging (SEI) capability and backscattered electron imaging (BEI) . VANTAGE X-ray microanalysis system of THERMONORAN provides element identification, quantitative microanalysis and mapping down to boron.
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The Center for Nanoscience and Nanotechnology
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$75
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$50
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$160 operator
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210 operator
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Dr. Alexander Tsukernik, Mrs. Netta Hendler
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MNCF Director
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alextsuk@post.tau.ac.il
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03-6405713
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Electron Beam Lithography RAITH 150
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Resolutions of 50 nm for direct-write lithographic applications.
* Filament type: Schottky Thermal Field Emission
* Selectable beam energy 200 V - 30 kV
* Probe current: 4 pA- 10nA
* Writing field: 1 micron - 800 micron
* Alignment accuracy (<100 um field): 60 nm
* Field stitching and mix and match accuracy: 60 nm (100 um fields).
* Writing speed: 10 MHz
* Sample handling: full 6" mask and wafer
* Image resolution: 2.0 nm @ 20 kV, 4.0 nm @ 1 kV
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The Center for Nanoscience and Nanotechnology
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$75
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$50
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$160 operator
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210 operator
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Dr. Alexander Tsukernik
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MNCF Director
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alextsuk@post.tau.ac.il
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03-6405713
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SEM JEOL 6400 and Elphy Electron Beam Lithography
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Software-oriented, analytical-grade SEM, which is capable of acquiring and digitizing images. The microscope is equiped with the Raith Elphy Quantum e-beam lithography system with electrostatic beam blanker and stage motor controller fully integrated into the SEM. ELPHY Quantum hardware is a specifically designed 16 bit, 2.5 MHz DAC vector scan beam deflection PC board installed into a state of the art Windows computer.
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The Center for Nanoscience and Nanotechnology
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$55
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$30
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$105*
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$105
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Dr. Alexander Tsukernik, Mr. Denis Glozman
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MNCF Director
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alextsuk@post.tau.ac.il
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03-6405713
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Instrument
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Description
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Equipment Location
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TAU Faculty
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Academia
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Industry
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Operator
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Faculty in Charge
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Contact email
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Contact phone
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Operator
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Self
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AFM Agilent (Molecular Imaging) PicoPlusTM PicoSPM II (MI)
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In addition to presenting a surface image, SPM can also provide quantitative measurements of feature sizes, such as step height, and other sample characteristics, such as surface potential, capacitance and friction measurements. Molecular Imaging (Agilent) PicoPlusTM PicoSPM II (MI) – High resolution Atomic Force Microscpoy (AFM) and Scanning Tunneling Microscopy (STM), liquid AFM, Current and capacitance microscopy.
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The Center for Nanoscience and Nanotechnology
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$30
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$10
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$40 self use $60 operator
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NA
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Moshe Eliyahu
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MNCF Director
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mosheel@eng.tau.ac.il
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03-6405183
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AFM Veeco MultiModeTM Nano Scope IV
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Scanning Probe Microscopy (SPM), provides atomic or near-atomic-resolution surface topography. In addition to presenting a surface image, SPM can also provide quantitative measurements of feature sizes, such as step height, and other sample characteristics, such as surface potential, capacitance and friction measurements. Veeco (Digital Instruments) MultiModeTM Nano Scope IV- AFM, Magnetic Force Microscopy, Close-loop picoforce microscopy, Fast scanning AFM Kelvin Force Microscopy.
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The Center for Nanoscience and Nanotechnology
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$30
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$10
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as above
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NA
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Moshe Eliyahu
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MNCF Director
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mosheel@eng.tau.ac.il
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03-6405183
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ESEM Quanta 200 FEG
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An environmental scanning electron microscope (ESEM) with three vacuum modes: high vacuum (<10-3torr), low vacuum (<1torr) and wet-mode (<10 torr).
Detectors for surface analysis: high vacuum conventional Everhart-Thornley detector, low vacuum large-field gaseous detector (LFD) and wet-mode Gaseous SE detector (GSED). Peltier cooling stage is used for control of sample temperature in wet-mode. Solid-state detector (SSD) or Gaseous Analytic Detector (GAD) is used for electron backscattered imaging. Scanning. Transmission Electron Microscope (STEM) detector is provided in high vacuum and WetSTEM device in wet-mode.
Special attachments: Kammarath&Weiss Tensile system, NORDLYS II HKL electron backscattered diffraction (EBSD) system, and Oxford liquid nitrogen cooled Si EDS detector for element analysis.
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Wolfson MRC
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$65
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$65
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$130
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$200
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Dr. Zahava Barkay
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MC Director
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barkay@post.tau.ac.il
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03-6407818
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UHV STM
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STM/AFM unit.Image temperatures 25K (by liquid helium cooling) to 600K (by resistive heating). AFM modes contact and non-contact.
In addition, the system is equipped with a vacuum load-lock, ion gun and heaters for surface preparation, and LEED/AUGER surface characterization techniques.
Contact persons: Prof. Yossi Rosenwaks, School of Electrical Engineering and Dr. Gil Markovich, School of Chemistry.
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The Center for Nanoscience and Nanotechnology
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-
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Yossi Rosenwaks, Gil Markovich
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gilmar@post.tau.ac.il
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Instrument
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Description
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Equipment Location
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TAU Faculty
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Academia
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Industry
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Operator
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Faculty in Charge
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Contact email
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Contact phone
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Operator
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Self
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LEXT confocal microscope, Olympus (Clean Rooom)
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Confocal laser scanning microscope. Both 3D observation and high-precision 3D measurement are possible in real time. Designed for sub-micron imaging, with lateral 0.12um and 0.01 um Z resolution and accurate three-dimensional measurement capability.
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The Center for Nanoscience and Nanotechnology
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$75
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$50
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$105*
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$105
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Assaf Hazzan
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MNCF Director
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03-6407926
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K&S Wire Bonder
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The Center for Nanoscience and Nanotechnology
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20 $ for 50 bonds maximum
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TBD
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TBD
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Gregory Avrushchenko
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MNCF Director
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oksman@eng.tau.ac.il
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03-6407926
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VST TFDS-680 Evaporator
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A general purpouse deposition system for metallic layers on wafers, with sizes varing from 5" to pieces. 6 e-gun sources, 1 thermal sources, rotating sample holder, cooling capabilities for the sample from liquid N2. two load loack acces 39 & 20 cm.metals evaporated Cr ,Au ,Ti ,Ag ,Co ,Ni ,Sio2 ,Al ,80%Ni20%Cr ,Pt ,Cu. Base pressure is 3x10-8 Torr.
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The Center for Nanoscience and Nanotechnology
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$75
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$50
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process dependent
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process dependent
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Assaf Hazzan
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MNCF Director
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oksman@eng.tau.ac.il
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03-6407926
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Clean Rooms
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Class 10000 and Class 1000 clean rooms
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The Center for Nanoscience and Nanotechnology
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$75
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$50
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$105*
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$105
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Assaf Hazzan
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MNCF Director
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oksman@eng.tau.ac.il
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03-6407926
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Profilometer Dektak® 8 Veeco (Clean Room)
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The Dektak® 8 Advanced Development Profiler combines high repeatability, low-force sensor technology, and advanced 3D data analysis for surface characterization of MEMS, semiconductors and other thin/thick films
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The Center for Nanoscience and Nanotechnology
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$75
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$50
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$105*
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$105
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Assaf Hazzan
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MNCF Director
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oksman@eng.tau.ac.il
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03-6407926
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Wet Benches (Clean Room)
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Capability of photoresist coating and developing. Cleaning and wet etching, for processing silicon and compound semiconductors.
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The Center for Nanoscience and Nanotechnology
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$75
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$50
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$105*
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$105
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Assaf Hazzan
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MNCF Director
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oksman@eng.tau.ac.il
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03-6407926
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Oerlicon RIE PlasmaTherm -790 RIE (Clean room)
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The PlasmaTherm -790 RIE system is used to etch /strip dielectric and organic films such as silicon dioxide, silicon nitride or SiOxNy, polysilicon, silicon, polyimide, photoresists and etc.
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The Center for Nanoscience and Nanotechnology
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$75
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$50
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$105*
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$105
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Assaf Hazzan
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MNCF Director
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oksman@eng.tau.ac.il
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03-6407926
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MJB3 Contact Mask Aligner, KARL SUSS
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The Karl Suss MJB3 exposure system is an optical contact mask aligner which aligns and transfer patterns from a quartz or glass mask to a photoresist coated wafer by exposing it to UV light 365 nm wavelength.
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The Center for Nanoscience and Nanotechnology
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$75
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$50
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$105*
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$105
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Assaf Hazzan
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MNCF Director
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oksman@eng.tau.ac.il
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03-6407926
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Plasma Cleaner Diener Pico (Clean Eoom)
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Low pressure Plasma Cleaner
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$75
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$50
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$105*
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$105
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Assaf Hazzan
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MNCF Director
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oksman@eng.tau.ac.il
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03-6407926
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Glove box Farm
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Glove-box "farm" which includes 9 glove-boxes attached togeher equipped with chemical lab, evaporator, vacuum oven, freezer, evaporator and various characterization tools
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Yearly subscription
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Yearly subscription
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TBD
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TBD
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Gregory Avrushchenko
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MNCF Director
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griga@post.tau.ac.il
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03-6405713
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Do'stlaringiz bilan baham: |
