and the interstate bands should be analyzed well before fabricating the
device. Large recombination at the interface of the device will not allow
the solar cell to perform the expected operations. Band o
ff set study on
CdS/Cu
2
ZnSnS
4
was carried out with the synchrotron radiation pho-
toemission spectroscopy. The study on the interface has revealed that
the band alignment is type II, which will have large recombination at
the interface resulting in non-suitable nature for solar cell application
[62]
. Better band alignment of the device will have improved perfor-
mance. Heterojunction made of p-Cu
2
CdSnS
4
/n-ZnS has better photo-
sensitivity at the UV wave lengths which makes the device more sui-
table for photodetector application. X-ray photoelectron spectroscopy
measurements have revealed that the device is type I band aligned and
more suitable for UV photodetector applications
[63]
.
Investigation on the experimental and theoretical analysis were
carried out for Ag2ZnSnSe4 (AZTSe)/CdS heterojunction. Results reveal
that the CdS had higher conduction band minimum than the AZTS in-
terface which results in an ideal band alignment for photovoltaic ap-
plication
[64]
. Band o
ffset analysis using x-ray photoelectron spectro-
scopy is carried out for the heterojunction CZTS/CdS/ZnO using
first
principle calculations method. The bands forms as type II with the band
gap of 0.13 eV and 1 eV which makes less barrier to electrons allowing
the recombination better
[65]
. Conduction band o
ffset study on the
CZTS and CdS is calculated with the 0.2 eV allowing the CdS to be used
as bu
ffer layer in solar cells
[66]
. Device properties of the solar cell is
analyzed with the identi
fication of the defects involved in the layers
and the type of bands
[67]
. To identify the device property with the
band alignment of the layers and substrates of the solar cells its per-
formance on various substrates has been studied in the following sec-
tions.
4.1. Fabrication of CZTS solar cell on Molybdenum(Mo) foil
Molybdenum (Mo) is the tremendous preference for the use of back
contact electrode of CIGS based photovoltaic. Because of its relative
stability is better at processing temperature after which its low contact
resistance to CIGS based photovoltaic. Molybdenum (Mo) is a silver like
appearance and it has the 6th highest melting point of all elements. The
resistivity value of Molybdenum (Mo) is nearly 5 × 10
−5
Ωcm
[68
–70]
.
The Molybdenum (Mo) is deposited on soda lime glass (SLG) through
vacuum techniques such as electron gun approach and sputtering
technique with an inexpensively
[70,71]
. CuInS
2
(CIS) based photo-
voltaic device also use Molybdenum (Mo) as back contact electrode
[72]
. CIGS/Mo interface having ohmic contact conduct with MoSe
2.
Raud and Nicolet work on the Mo/Se, Mo/In, and Mo/Cu di
ffusion
pairs has shown Se to react with Mo to form MoSe
2
with lesser quantity
at annealing temperature of nearly 600 °C
[73]
.
Assmann et al.
[74]
has shown the presence of MoSe2 at the Mo/
CIGS interface and its better mechanical strength at the interface which
has the signi
ficance of higher adhesion. Shimizu et al.
[75]
has sug-
gested that the Molybdenum (Mo) thickness will be various between the
0.2
–0.07 µm from the properties of CIGS based photovoltaic, whereas
the optimum thickness of the Molybdenum (Mo) is 0.2 µm. Introducing
water vapor during CIGS growth increases the overall photovoltaic
properties
[74,75]
. Kim et al.
[76]
has attempted and suggested that
Mo/Mo bilayer with Na doped combination deposited on Alumina
substrate. It will be enhanced the photovoltaic performance. Guillen
et al.
[77]
has suggested the properties of Molybdenum (Mo) based thin
films evaporated onto huge area of 30 × 30 cm
2
on soda lime glass
(SLG) substrate at di
fferent depositions. During the formation of films,
sodium (Na) ion di
ffuse from the soda lime glass (SLG) substrate
through the Mo based back contact into the absorber layer. The di
ffu-
sion of sodium (Na) into absorber
film depends upon the deposition
conditions of the Mo based back contact
[78]
. Jaegaermann et al.
[79]
and Wada et al.
[80]
investigated the schottky barrier in Molybdenum
(Mo)
films when deposited on the CIGS films. Due to the schottky
barrier at the Mo/CIGS interface, resistive losses have occurred which
a
ffected the device efficiency.
Tong et al.
[81]
investigated the vacuum thermal annealing ap-
proach based on Molybdenum (Mo) back contacts to enhance the
crystalline properties of Molybdenum (Mo)
films and CuInS
2
(CIS) ab-
sorber which leads to enhance the photovoltaic e
fficiency. CZTS based
thin
film photovoltaic was fabricated using Molybdenum (Mo) as a
back-contact electrode. Rapid thermal annealing technique based on
Molybdenum (Mo) back contact electrode has enhanced the crystalline
properties of evaporated CZTS absorber with better e
fficiency
[82]
.
Mostly CZTS based thin
film photovoltaic were made using metal foils
substrate like stainless steel, Molybdenum (Mo) and aluminum (Al) as a
back contacts electrode
[83]
. Primary choice is Molybdenum (Mo) foil
substrate as a back contact because of its well-matched coe
fficient of
linear expansion is 5.2 × 10
−6
K
−1
, which is a better expansion range
compare to other metal foil substrate
[84]
. The purity of Molybdenum
(Mo) foil will be high so no need for barrier layer at the photovoltaic
device structure and high purity level Molybdenum (Mo) foil to en-
hance the electrical properties of the absorbers of the photovoltaic
[85]
.
The Molybdenum (Mo) foil is also a
flexible metallic substrate with low
cost, less-weight, durable and resistant to high temperature fabrication
processes. Hence the total cost of fabrication is less to construct a
photovoltaic module with
flexible metallic substrates. Finally, Mo-
lybdenum (Mo) foil is used to enhance the performance of absorber
with improved photovoltaic performance
[83]
.
4.2. CZTS on Si substrate
The
first-generation photovoltaic is likewise known as conventional,
traditional or wafer-based cells are crafted from crystalline silicon.
Commercially to be had and fabricated photovoltaic devices includes
substances inclusive of polysilicon and mono crystalline silicon. The
maximum commonplace bulk fabric for photovoltaic is crystalline si-
licon (c-Si), which is likewise known as solar grade silicon. Bulk silicon
is separated into the multiple categories in step with crystallinity and
crystal length within the ensuring ingot, ribbon or wafer. These cells are
functionally primarily based on the concept of p-n junction photo-
voltaics
[86]
. Monocrystalline silicon photovoltaics are more e
fficient
and more expensive than most other kind of cells. The corners of the
cells look clipped, like an octagon due to the method worried in cutting
the wafer fabric from the cylindrical ingots, that are typically grown
through the Czochralski process technique. Solar panels using mono-Si
cells display a one of a kind sample of small white diamonds
[87]
.
Epitaxial wafers of crystalline silicon may be grown on a mono-
crystalline silicon "seed" wafer by means of chemical vapor deposition
(CVD). Then the wafers may be indi
fferent as self-supporting wafers of
some standard thickness (e.g., 250 µm) and manipulated through hand.
Then the wafers are immediately substituted for wafer cells cut from
monocrystalline silicon ingots
[88]
.
Photovoltaic made with this "ker
fless" have efficiencies drawing
close the one of wafer-cut cells. Instead, reduced cost of fabrication was
accomplished when the chemical vapor deposition (CVD) can be per-
formed at atmospheric pressure in a high-throughput inline manner.
The surface of epitaxial wafers is textured to improved light absorption
[89]
. Polycrystalline silicon cells manufactured from the forged rec-
tangular ingots and huge blocks of molten silicon are carefully cooled
and solidi
fied. They consist of small crystals giving the fabric its stan-
dard metal
flake effect. Polysilicon cells are the maximum common
substances utilized in photovoltaics because of its monetary avail-
ability. These cells are better than monocrystalline silicon. Ribbon si-
licon is a sort of polycrystalline silicon which is formed through the
drawing
flat thin films from molten silicon which results in a poly-
crystalline shape. These cells are inexpensive to make than multi-Si
because of extraordinary discount in silicon waste, as this method does
not require sawing from ingots
[90]
. Silicon thin-
film cells were
M. Ravindiran, C. Praveenkumar
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